Kwicandelo lokuvelisa i-semiconductor, njengesixhobo esiphambili esimisela ukuchaneka kwenkqubo yokuvelisa i-chip, ukuzinza kwendawo yangaphakathi yomatshini we-photolithography kubaluleke kakhulu. Ukususela ekuvuseleleni umthombo wokukhanya we-ultraviolet ogqithisileyo ukuya ekusebenzeni kweqonga lokuhamba ngokuchaneka kwe-nanoscale, akunakubakho kuphambuka okuncinci kwikhonkco ngalinye. Iziseko zegranite, ezinoluhlu lweempawu ezizodwa, zibonisa iingenelo ezingenakuthelekiswa nanto ekuqinisekiseni ukusebenza okuzinzileyo koomatshini be-photolithography kunye nokuphucula ukuchaneka kwe-photolithography.
Ukusebenza kakuhle kokukhusela i-electromagnetic
Ingaphakathi lomatshini we-photolithography lizaliswe yindawo entsonkothileyo ye-electromagnetic. Ukuphazamiseka kwe-electromagnetic (EMI) okuveliswa zizinto ezifana nemithombo yokukhanya ye-ultraviolet egqithisileyo, ii-drive motors, kunye nezixhobo zamandla ezisebenzisa i-frequency ephezulu, ukuba azilawulwa ngokufanelekileyo, ziya kuchaphazela kakhulu ukusebenza kwezixhobo ze-elektroniki ezichanekileyo kunye neenkqubo ze-optical ngaphakathi kwezixhobo. Umzekelo, ukuphazamiseka kunokubangela ukuphambuka okuncinci kwiipateni ze-photolithography. Kwiinkqubo zokuvelisa eziphambili, oku kwanele ukukhokelela kuqhagamshelo olungalunganga lwe-transistor kwi-chip, okunciphisa kakhulu isivuno se-chip.
I-Granite yinto engeyoyesinyithi kwaye ayiqhubi umbane yodwa. Akukho nto iyenzekayo xa i-electron ingena kwi-electron ebangelwa kukuhamba kwee-electron zasimahla ngaphakathi njengakwizinto zesinyithi. Olu phawu lwenza ukuba ibe ngumzimba wendalo okhuselayo we-electromagnetic, onokuthintela ngempumelelo indlela yokudlulisela ukuphazamiseka kwe-electromagnetic yangaphakathi. Xa i-magnetic field etshintshanayo eveliswa ngumthombo wokuphazamiseka kwe-electromagnetic yangaphandle isasazeka kwisiseko se-granite, ekubeni i-granite ingenamagnethi kwaye ayinakutsalwa, i-magnetic field etshintshanayo kunzima ukungena kuyo, ngaloo ndlela ikhusela izinto eziphambili zomatshini we-photolithography ezifakwe kwisiseko, ezifana nezinzwa zokuchaneka kunye nezixhobo zokulungisa ilensi ye-optical, kwimpembelelo yokuphazamiseka kwe-electromagnetic kunye nokuqinisekisa ukuchaneka kokudluliselwa kwepateni ngexesha lenkqubo ye-photolithography.
Ukuhambelana okuhle kakhulu kwe-vacuum
Ngenxa yokuba ukukhanya okugqithisileyo kwe-ultraviolet (EUV) kutsalwa lula zizo zonke izinto, kuquka nomoya, oomatshini be-lithography be-EUV kufuneka basebenze kwindawo engenamoya. Kule ndawo, ukuhambelana kwezixhobo kunye nendawo engenamoya kubaluleke kakhulu. Kwi-vacuum, izixhobo zinokunyibilika, zisuse kwaye zikhuphe igesi. Igesi ekhutshiweyo ayifunxi nje kuphela ukukhanya kwe-EUV, inciphise amandla kunye nokusebenza kakuhle kokuhambisa ukukhanya, kodwa ikwangcolisa iilensi ze-optical. Umzekelo, umphunga wamanzi ungcolisa iilensi, kwaye ii-hydrocarbon zinokubeka iilensi zekhabhoni kwiilensi, nto leyo echaphazela kakhulu umgangatho we-lithography.
I-Granite ineempawu zeekhemikhali ezizinzileyo kwaye ayikhuphi igesi kwindawo engenamoya. Ngokutsho kovavanyo lobuchwephesha, kwindawo engenamoya yomatshini we-photolithography (njengendawo engenamoya ecocekileyo kakhulu apho kukho inkqubo ye-optical yokukhanyisa kunye nenkqubo ye-imaging optical kwigumbi eliphambili, ifuna i-H₂O < 10⁻⁵ Pa, CₓHᵧ < 10⁻⁷ Pa), izinga lokukhupha igesi kwisiseko se-granite liphantsi kakhulu, liphantsi kakhulu kunezinye izinto ezifana neentsimbi. Oku kwenza ukuba ingaphakathi lomatshini we-photolithography ligcine inqanaba eliphezulu le-vacuum kunye nokucoceka ixesha elide, ukuqinisekisa ukuhanjiswa okuphezulu kokukhanya kwe-EUV ngexesha lokudluliselwa kunye nendawo yokusetyenziswa ecocekileyo kakhulu kwiilensi ze-optical, ukwandisa ubomi benkonzo yenkqubo ye-optical, kunye nokuphucula ukusebenza ngokubanzi komatshini we-photolithography.
Ukumelana nokungcangcazela okunamandla kunye nozinzo lobushushu
Ngexesha lenkqubo ye-photolithography, ukuchaneka kwinqanaba le-nanometer kufuna ukuba umatshini we-photolithography ungabi nokungcangcazela okanye ukuguqulwa kobushushu kancinci. Ukungcangcazela kwendalo okubangelwa kukusebenza kwezinye izixhobo kunye nokuhamba kwabasebenzi kwindawo yokusebenzela, kunye nobushushu obuveliswa ngumatshini we-photolithography ngokwawo ngexesha lokusebenza, konke oku kunokuphazamisa ukuchaneka kwe-photolithography. I-Granite inobunzima obuphezulu kunye nokwakheka okuqinileyo, kwaye inokumelana nokungcangcazela okuhle kakhulu. Ulwakhiwo lwayo lwangaphakathi lwekristale yezimbiwa luncinci, olunokunciphisa ngokufanelekileyo amandla okungcangcazela kwaye luthintele ngokukhawuleza ukusasazeka kokungcangcazela. Idatha yovavanyo ibonisa ukuba phantsi komthombo ofanayo wokungcangcazela, isiseko se-granite sinokunciphisa i-amplitude yokungcangcazela ngaphezulu kwe-90% kwimizuzwana eyi-0.5. Xa kuthelekiswa nesiseko sesinyithi, inokubuyisela izixhobo ekuzinzeni ngokukhawuleza, iqinisekisa indawo echanekileyo phakathi kwelensi ye-photolithography kunye ne-wafer, kwaye iphephe ukufiphala kwepateni okanye ukungalungelelani okubangelwa kukungcangcazela.
Okwangoku, i-coefficient yokwandiswa kobushushu begranite iphantsi kakhulu, malunga (4-8) ×10⁻⁶/℃, engaphantsi kakhulu kuneyezinto zesinyithi. Ngexesha lokusebenza komatshini we-photolithography, nokuba ubushushu bangaphakathi buyatshintshatshintsha ngenxa yezinto ezifana nokuveliswa kobushushu obuvela kumthombo wokukhanya kunye nokungqubana okuvela kumacandelo oomatshini, isiseko segranite sinokugcina uzinzo olulinganayo kwaye asiyi kudlula kwinguquko ebalulekileyo ngenxa yokwanda kunye nokucutheka kobushushu. Inika inkxaso ezinzileyo nethembekileyo kwinkqubo ye-optical kunye neqonga lokuhamba ngokuchanekileyo, igcina ukuhambelana kokuchaneka kwe-photolithography.
Ixesha leposi: Meyi-20-2025