Susa "amandla elitye" asemva kokwenziwa kwee-semiconductor - Izixhobo zegranite ezichanekileyo zingayila njani kwakhona umda wokuchaneka kokwenziwa kweetship

Uguquko Oluchanekileyo kwimveliso ye-semiconductor: Xa i-granite idibana netekhnoloji ye-micron
1.1 Izinto ezingalindelekanga ezifunyenweyo kwisayensi yezinto eziphathekayo
Ngokwengxelo ye-SEMI International Semiconductor Association ka-2023, ama-63% eefektri eziphambili zehlabathi aqalise ukusebenzisa iziseko zegranite endaweni yamaqonga esinyithi emveli. Eli litye lendalo, elivela kwi-magma condensation nzulu eMhlabeni, liphinda libhale imbali yokwenziwa kwe-semiconductor ngenxa yeempawu zalo ezizodwa zomzimba:

Inzuzo ye-innertia yobushushu: i-coefficient yokwandiswa kobushushu ye-granite eyi-4.5×10⁻⁶/℃ yi-1/5 kuphela yentsimbi engagqwaliyo, kwaye uzinzo oluyimilinganiselo ye-±0.001mm lugcinwa kumsebenzi oqhubekayo womatshini we-lithography.

Iimpawu zokudambisa ukungcangcazela: i-coefficient yangaphakathi yokungqubana iphezulu ngokuphindwe ka-15 kuneyesinyithi esityhidiweyo, ifunxa ngempumelelo izixhobo zokungcangcazela okuncinci

Uhlobo lwe-Zero magnetization: susa ngokupheleleyo impazamo ye-magnetic kumlinganiselo we-laser

1.2 Uhambo lokutshintsha kwesimo sengqondo ukusuka kolwam ukuya koluhle kakhulu
Ukuthatha isiseko semveliso esikrelekrele seZHHIMG eShandong njengomzekelo, isiqwenga segranite eluhlaza kufuneka sidlule:

Umatshini wokugaya ochanekileyo kakhulu: iziko lomatshini wokudibanisa olune-axis ezintlanu kangangeeyure ezingama-200 zokugaya okuqhubekayo, uburhabaxa bomphezulu ukuya kuthi ga kwi-Ra0.008μm

Unyango lokwaluphala okwenziwayo: Iiyure ezingama-48 zokukhululwa koxinzelelo lwendalo kwindawo yokusebenzela yobushushu obungaguqukiyo kunye nomswakama, nto leyo ephucula uzinzo lwemveliso ngama-40%
Okwesibini, qhekeza iingxaki ezintandathu zokuchaneka kwemveliso ye-semiconductor "isisombululo selitye"
2.1 Inkqubo yokunciphisa izinga lokuqhekeka kwe-wafer

Umboniso wetyala: Emva kokuba umatshini wokuseka iitshiphusi eJamani wamkele iqonga lethu le-granite elidadayo ngegesi:

Ububanzi be-wafer	ukunciphisa isantya setshiphusi	ukuphuculwa kokuthamba
Ii-intshi ezili-12	67%	≤0.001mm
Ii-intshi ezili-18	82%	≤0.0005mm

2.2 Inkqubo yokuphumelela kokulungelelaniswa kweLithographic ngokuchanekileyo

Inkqubo yokubuyisela ubushushu: I-sensor ye-ceramic efakwe ngaphakathi ijonga ukuguquguquka kwemilo ngexesha langempela kwaye ilungisa ngokuzenzekelayo ukuthambekela kweqonga
Idatha elinganisiweyo: phantsi kokuguquguquka kwe-28℃±5℃, ukuchaneka kokubethela kuyatshintshatshintsha ngaphantsi kwe-0.12μm