Kwintsimi yokuvelisa i-semiconductor, njengesixhobo esisisiseko esichaza ukuchaneka kwenkqubo yokuvelisa i-chip, ukuzinza kwendawo yangaphakathi yomshini we-photolithography kubaluleke kakhulu. Ukusuka kwimincili yomthombo wokukhanya ogqithisileyo we-ultraviolet ukuya ekusebenzeni kweqonga lokuhamba elichanekileyo le-nanoscale, akunakubakho ukutenxa kuncinci kuyo yonke ikhonkco. Iziseko zeGranite, ezinoluhlu lweempawu ezikhethekileyo, zibonisa iingenelo ezingenakulinganiswa ekuqinisekiseni ukusebenza okuzinzile kwemishini ye-photolithography kunye nokuphucula ukuchaneka kwe-photolithography.
Ukusebenza okugqwesileyo kwe-electromagnetic shielding
Ingaphakathi lomatshini we-photolithography lizaliswe yindawo enzima ye-electromagnetic. Ukuphazamiseka kwe-Electromagnetic (EMI) eveliswa ngamalungu anje ngemithombo yokukhanya ye-ultraviolet egqithisileyo, iimotor zokuqhuba, kunye nokuhanjiswa kwamandla okujikeleza okuphezulu, ukuba akulawulwanga ngokufanelekileyo, kuya kuchaphazela kakhulu ukusebenza kwamacandelo e-elektroniki achanekileyo kunye neenkqubo zokukhanya ngaphakathi kwesixhobo. Ngokomzekelo, ukuphazamiseka kunokubangela ukuphambuka okuncinci kwiipateni zefotolithography. Kwiinkqubo zokuvelisa eziphambili, oku kwanele ukukhokelela ekudibaneni kwe-transistor engalunganga kwi-chip, ukunciphisa kakhulu isivuno se-chip.
I-Granite yinto engeyiyo isinyithi kwaye ayiqhubeki umbane ngokwayo. Akukho nto ye-electromagnetic induction induction ebangelwa yintshukumo yee-electron zasimahla ngaphakathi njengakwimathiriyeli yesinyithi. Olu phawu luyenza ibe ngumzimba okhuselayo wendalo we-electromagnetic, onokuthintela ngokufanelekileyo indlela yothumelo lophazamiseko lwangaphakathi lombane. Xa indawo etshintshanayo yamagnetic eveliswa ngumthombo wangaphandle wokuphazamiseka kwe-electromagnetic isasazeka kwisiseko segranite, kuba igranite ayinamagnetic kwaye ayinakukwazi ukwenza imagnethi, indawo etshintshanayo yamagnetic kunzima ukungena kuyo, ngaloo ndlela ikhusela amacandelo aphambili omatshini wefotolithography efakwe kwisiseko, njengezinzwa ezichanekileyo kunye ne-optical lens uhlengahlengiso kwi-electromagnetic impembelelo ye-electromagnetic lens ukuhanjiswa kwepateni ngexesha lenkqubo ye-photolithography.
ukuhambelana vacuum Excellent
Ngenxa yokuba ukukhanya okugqithisileyo kwe-ultraviolet (EUV) kufunxwa ngokulula zizo zonke izinto, kubandakanywa nomoya, ii-EUV lithography machines kufuneka zisebenze kwindawo yokufunxa. Ngeli xesha, ukuhambelana kwezixhobo zokusebenza kunye nemeko yevacuum kubaluleke kakhulu. Kwivacuum, izixhobo zinokunyibilika, zinyibilike kwaye zikhuphe igesi. Irhasi ekhutshiweyo ayifunxa kuphela ukukhanya kwe-EUV, inciphisa ubunzulu kunye nempumelelo yokuhambisa isibane, kodwa inokungcolisa iilensi zamehlo. Ngokomzekelo, umphunga wamanzi unokukhupha iilensi, kwaye ii-hydrocarbons zinokufaka iilensi zekhabhoni kwiilensi, zichaphazela kakhulu umgangatho welithography.
Igranite ineempawu ezizinzileyo zeekhemikhali kwaye ayikhupheli igesi kwindawo yokufunxa. Ngokovavanyo lobuchwephesha, kwindawo yokufunxa umatshini wokucoca ifotolithography (efana ne-ultra-clean vacuum bume apho inkqubo yokukhanya yokukhanya kunye ne-imaging optical system ikwigumbi eliphambili, ifuna i-H₂O <10⁻⁵ Pa, CₓHᵧ <10⁻ isiseko esisezantsi kakhulu, inqanaba elisezantsi lePapa kunezinye izinto ezifana neentsimbi. Oku kwenza ukuba indawo yangaphakathi yomatshini we-photolithography igcine iqondo eliphezulu le-vacuum kunye nokucoceka ixesha elide, ukuqinisekisa ukuhanjiswa okuphezulu kokukhanya kwe-EUV ngexesha lokudluliselwa kunye ne-ultra-clean yokusetyenziswa kwendawo yeelensi zamehlo, ukwandisa ubomi benkonzo yenkqubo yokukhanya, kunye nokuphucula ukusebenza ngokubanzi komatshini we-photolithography.
Ukumelana nokungcangcazela okunamandla kunye nokuzinza kwe-thermal
Ngethuba lenkqubo ye-photolithography, ukuchaneka kwinqanaba le-nanometer kufuna ukuba umatshini we-photolithography akufanele ube ne-vibration encinci okanye i-thermal deformation. Ukushukuma kokusingqongileyo okwenziwa ngokusebenza kwezinye izixhobo kunye nokunyakaza kwabasebenzi kwi-workshop, kunye nobushushu obuveliswa ngumatshini we-photolithography ngokwawo ngexesha lokusebenza, konke kunokuphazamisa ukuchaneka kwe-photolithography. I-Granite inoxinano oluphezulu kunye nokwakheka okuqinileyo, kwaye inokumelana nokungcangcazela okugqwesileyo. Ubume bayo bangaphakathi bekristale yamaminerali bucwengile, obunokuthi buthintele ngokufanelekileyo amandla okungcangcazela kwaye bucinezele ngokukhawuleza ukusasazwa kokungcangcazela. Idatha yovavanyo ibonisa ukuba phantsi komthombo ofanayo wokungcangcazela, isiseko segranite sinokunciphisa i-vibration amplitude ngaphezu kwe-90% ngaphakathi kwe-0.5 imizuzwana. Xa kuthelekiswa nesiseko sesinyithi, inokubuyisela izixhobo ekuzinzeni ngokukhawuleza, iqinisekisa indawo echanekileyo yobudlelwane phakathi kwe-photolithography lens kunye ne-wafer, kunye nokuphepha ukufiphaza kwepateni okanye ukungahambi kakuhle okubangelwa yi-vibration.
Okwangoku, i-coefficient yokwandiswa kwe-thermal ye-granite iphantsi kakhulu, malunga (4-8) × 10⁻⁶/℃, ephantsi kakhulu kunezinto zensimbi. Ngethuba lokusebenza komatshini we-photolithography, nangona ukushisa kwangaphakathi kuguqulwa ngenxa yezinto ezifana nokuveliswa kobushushu ukusuka kumthombo wokukhanya kunye nokukhuhlana ukusuka kumacandelo omatshini, isiseko se-granite sinokugcina ukuzinza kwe-dimensional kwaye asiyi kuba ne-deformation ebalulekileyo ngenxa yokwandiswa kwe-thermal kunye nokunciphisa. Inika inkxaso ezinzileyo kunye nethembekileyo yenkqubo ye-optical kunye neqonga lokuhamba ngokuchanekileyo, ukugcina ukuhambelana kokuchaneka kwe-photolithography.
Ixesha lokuposa: May-20-2025