Kwimveliso ye-semiconductor, umatshini we-photolithography sisixhobo esibalulekileyo esimisela ukuchaneka kweetships, kwaye isiseko segranite, esineempawu ezininzi, siye saba yinxalenye ebalulekileyo yomatshini we-photolithography.
Uzinzo lobushushu: "Isihlangu" ngokuchasene notshintsho lobushushu
Xa umatshini we-photolithography usebenza, uvelisa ubushushu obuninzi. Nokuba ubushushu obuyi-0.1℃ kuphela bunokubangela ukuguquka kwezixhobo kwaye buchaphazele ukuchaneka kwe-photolithography. I-coefficient yokwanda kobushushu be-granite iphantsi kakhulu, yi-4-8 × 10⁻⁶/℃ kuphela, emalunga ne-1/3 yentsimbi kunye ne-1/5 ye-aluminium alloy. Oku kwenza isiseko se-granite sigcine uzinzo olulinganayo xa umatshini we-photolithography usebenza ixesha elide okanye xa ubushushu bendalo butshintsha, ukuqinisekisa indawo echanekileyo yezixhobo ezibonakalayo kunye nezakhiwo zoomatshini.
Ukusebenza kakuhle kakhulu kokulwa nokungcangcazela: "Isiponji" esifunxa ukungcangcazela
Kwifektri ye-semiconductor, ukusebenza kwezixhobo ezijikelezileyo kunye nokuhamba kwabantu konke oku kunokuvelisa ukungcangcazela. I-Granite inobunzima obuphezulu kunye nokwakheka okuqinileyo, kwaye ineempawu ezintle zokungcangcazela, kunye nomlinganiselo wokungcangcazela ophindwe kabini ukuya kahlanu kuneentsimbi. Xa ukungcangcazela kwangaphandle kudluliselwa kwisiseko se-granite, ukungqubana phakathi kweekristale zangaphakathi zeminerali kuguqula amandla okungcangcazela abe ngamandla obushushu okusasaza, okunokunciphisa kakhulu ukungcangcazela ngexesha elifutshane, okuvumela umatshini we-photolithography ukuba ubuyisele ngokukhawuleza uzinzo kwaye uphephe ukufiphala okanye ukungalungelelani kakuhle kwepateni ye-photolithography ngenxa yokungcangcazela.
Uzinzo lweekhemikhali: "Umgcini" weNdalo ecocekileyo
Ingaphakathi lomatshini we-photolithography lidibana neekhemikhali ezahlukeneyo, kwaye izinto zesinyithi eziqhelekileyo zinokonakala okanye zikhutshwe ngamasuntswana. I-Granite yenziwe ngeeminerali ezifana ne-quartz kunye ne-feldspar. Ineempawu zekhemikhali ezizinzileyo kunye nokumelana okunamandla kokubola. Emva kokuba imanziswe kwizisombululo ze-asidi kunye ne-alkali, ukubola komphezulu kuncinci kakhulu. Okwangoku, isakhiwo sayo esixineneyo asivelisi phantse nkunkuma okanye uthuli, sihlangabezana neemfuno zemigangatho ephezulu yokucoca kwaye sinciphisa umngcipheko wongcoliseko lwe-wafer.
Ukuziqhelanisa nokucubungula: "Izinto ezifanelekileyo" zokwenza iireyithingi ezichanekileyo
Izinto eziphambili zomatshini we-photolithography kufuneka zifakwe kumphezulu ochanekileyo. Ulwakhiwo lwangaphakathi lwegranite lufana kwaye kulula ukucutshungulwa ngokuchanekileyo okukhulu ngokusebenzisa ukugaya, ukupolisha kunye nezinye iindlela. Ubuthe tyaba bayo bunokufikelela kwi-≤0.5μm/m, kwaye ubuthe rhabaxa bomphezulu iRa yi-≤0.05μm, nto leyo enika isiseko esichanekileyo sokufakelwa kwezinto ezifana neelensi ze-optical.
Ubomi obude kunye nokungabikho kokugcinwa: "Izixhobo ezibukhali" zokunciphisa iindleko
Xa kuthelekiswa nezinto zesinyithi ezidla ngokudinwa nokuqhekeka xa zisetyenziswa ixesha elide, igranite ayiguquguquki okanye iqhekeke phantsi kwemithwalo eqhelekileyo, kwaye ayifuni unyango lomphezulu, ngaloo ndlela ithintela umngcipheko wokuxobuka nokungcoliswa. Kwiindlela ezisebenzayo, emva kokusetyenziswa iminyaka emininzi, izalathisi zokusebenza eziphambili zesiseko segranite zisenokuhlala zizinzile, nto leyo enciphisa iindleko zokusebenza kunye nokugcinwa kwezixhobo.
Ukususela ekuzinzeni kobushushu, ukuxhathisa ukungcangcazela ukuya ekungangeni kweekhemikhali, iimpawu ezininzi zesiseko segranite ziyahlangabezana ngokugqibeleleyo neemfuno zomatshini we-photolithography. Njengoko inkqubo yokwenziwa kweetships iqhubeka iphuhlisa ukuya kulungelelwano oluphezulu, iziseko zegranite ziya kuqhubeka nokudlala indima engenakutshintshwa kwicandelo lokwenziwa kwee-semiconductor.
Ixesha leposi: Meyi-20-2025